Kurt J.Lesker
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Laurell Technologies Corporation remains at the forefront of practical yet affordable tool design, while remaining absolutely dedicated to customer satisfaction.

Starting with a single idea from a customer who was unable to clean his GaAs wafers in 1985... We have, from these humble beginnings, cultivated a reputation for excellence and worldwide popularity with almost 20,000 installed. Yes, some ideas are more powerful than others, but hard work in the persistence of excellence rules the day.

  •  Our products are designed to be process development–friendly.
  •  Our application-specific approach allows us to offer even more functionality at less cost.
  •  We also configure our universally-designed systems to best meet your needs—we don't assume that we know what you need until you tell us.
  •  We have years of experience and expertise in handling valuable and fragile substrates. We've designed chucks for every kind of substrate imaginable — from the smallest, thinnest, most delicate substrates to heavy photomasks — and manufactured these chucks from the finest materials available.
  • Our systems allow you to easily develop the process that best fits your application, all while maintaining safe visualization of your substrate.

Spin Processors

HL Series

The Laurell HL Series spin coater is compact, packed with advanced features, and designed to the be the easiest spin coater to install in your glove box. This 650-series HL coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

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650 Series

The Laurell 650 Series spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).     

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EDC™ Series

The Laurell EDC™ Series Spin Processor is compact and packed with advanced features. This 650-series EDC system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates. Though this system has a 12,000 RPM capability with vacuum hold-down, it is recommended for only 3,000 RPM and non-vacuum chucks.

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‍Wet Stations

The Laurell WS-1000 Series Spin-Process Stations allow a fully configured and tested module to be constructed and shipped complete — requiring only the minimum of installation time. Easy to load and operate — everything is in convenient reach to the operator.

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