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(+65) 6284 3818

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sales@premier-sols.com

Enquriy

Semi-Conductors

Products

Semi-Conductors

01

Atomic Layer Deposition systems (ALD)

Basic Atomic Layer Deposition (ALD) technology concept is to deposit one atomic layer per cycle during deposition. ALD is a surface controlled layer-by-layer process for the deposition of thin films with atomic layer accuracy which is basic fundamentals of nano-technology. ALD is a Chemical Vapor Deposition (CVD) technique that enables surface-controlled, uniform, and conformal film growth at the atomic layer scale with excellent uniformity. Surface-controlled film growth is a unique feature of ALD that is based on sequential, self-limiting chemical reactions between gas-phase precursor molecules and active surface species. During a typical ALD process, at least two gas-phase precursors are pulsed sequentially into a reaction space where a substrate is located. A complete sequence (or cycle) is made up of a series of pulse and purge steps. Pulse steps are separated by purge steps to remove any remaining precursor and/or volatile reaction by-products from the reaction space between pulses. The Kurt J. Lesker Company offers different ALD process equipments to fit your individual needs; ALD150LE, ALD50LX, OCTOS and LUMINOS.
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ALD-150LX

ALD-150LX

LUMINOS— Multi-chamber thin film deposition and analysis manual cluster tool system for R&D applications requiring in-vacuum substrate transfer between chambers.

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OCTOS - Automated Cluster Tool

OCTOS - Automated Cluster Tool

OCTOS®—A fully automated cluster tool for pilot production scale processing of substrates requiring in-vacuum substrate transfer between chambers

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LUMINOS - Manual Cluster Tool

LUMINOS - Manual Cluster Tool

LUMINOS— Multi-chamber thin film deposition and analysis manual cluster tool system for R&D applications requiring in-vacuum substrate transfer between chambers.

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02

Etch and Deposition System

Plasma Etch - Plasma – Enhanced Chemical Vapor Deposition (PECVD), Reactive Ion Etching (RIE), ICP – RIE System, ICP PECVD An affordable plasma tool that can be used in research and process development or low volume production for precise etching and deposition on substrates up to 8" in diameter.
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Axic BENCHMARK 800-III® ICP ETCH and DEPOSITION

Axic BENCHMARK 800-III® ICP ETCH and DEPOSITION

The BenchMark 800-III® Inductively Coupled Plasma (ICP) Processing System from AXIC, Inc defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP PECVD) plasma processing

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Axic Iso-Lok 200® ICP Plasma System

Axic Iso-Lok 200® ICP Plasma System

The AXIC Iso-Lok 200® Inductively Coupled Plasma (ICP) Load-Locked Processing System from AXIC, Inc. defines a new concept in Deep Reactive Ion Etch (DRIE) and low temperature-low damage Plasma Enhanced Chemical Vapor Deposition (ICP-PECVD) plasma processing.

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03

Low Pressure Chemical Vapor Deposition (LPCVD) Furnace

4-inch LPCVD furnace for small production. Single or dual tube furnaces from Annealsys are available
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Annealsys - LC100

Annealsys - LC100

4-inch Low Pressure Chemical Vapor Deposition (LPCVD) furnace for small production.  Single or dual tube furnaces are available.

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04

Metal Organic Chemical Vapor Deposition (MOCVD)

MOCVD systems for substrates from 2-inch to 200 mm to fit requirements of R&D laboratories and small scale production. Utilization of state of the art Direct Liquid Injection (DLI) systems allows development of new materials with new chemical precursors. Annealsys has the solution
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Annealsys - MC 100

Annealsys - MC 100

Low cost 2-inch Metal Organic Chemical Vapor Deposition (MOCVD) system for R&D laboratory.  Deposition and annealing in the same chamber.

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05

Physical Vapor Deposition Systems (PVD)

Physical Vapor Deposition (PVD) is a broad term for deposition techniques that utilize the vaporized form of a desired coating material to create a deposited film on a substrate. Techniques include those that facilitate a physical (rather than chemical) vaporization of the base material, such as electron beam evaporation, thermal evaporation, point source evaporation, and magnetron sputtering.

The Kurt J. Lesker Company manufactures a wide array of PVD systems, including the aptly-named PVD Series, the NANO 36™ platform, the LAB 18 platform, the CMS Series, and the AXXIS platform.

Each of the PVD systems that The Kurt J. Lesker Company manufacture has a bevy of features and options suitable to tailor a platform for your particular application. These options include: load locks; various sputtering and evaporation sources; ion sources; substrate handling options such as heating, cooling, and biasing; and pumping options.

THERMAL SYSTEM
Thermal evaporation is a major thin film deposition technique particularly in R&D applications where the low installation costs and inexpensive, disposable evaporant “containers” are clear advantages.
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AXXIS -Multiple Deposition Techniques, Co-Deposition

AXXIS -Multiple Deposition Techniques, Co-Deposition

AXXIS™— Facilitates multiple deposition techniques and co-deposited films efficiently!

The University of Alberta uses Lesker AXXIS for glancing angle depositions (GLAD).

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NANO 36 - Entry to Mid-Level Deposition System

NANO 36 - Entry to Mid-Level Deposition System

  • Lesker most affordable deposition system platform, designed specifically with the entry to mid level user in mind.
  • It showcases our ability to provide the versatility and reliability that the Kurt J. Lesker Company has become known for around the world
  • The NANO 36 is designed to accommodate most evaporation processes, or it can be configured for magnetron sputtering applications
  • The NANO 36 is highly capable, affordable, and has a compact form factor
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CMS Series Overview

CMS Series Overview

CMS Series—Versatile thin film deposition systems for advanced materials research and development

The Chinese Academy of Sciences Institute of Physics uses Kurt J. Lesker CMS-18™ for advanced GMR/TMR research.

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SPECTROS Overview

SPECTROS Overview

The Kurt J. Lesker SPECTROS family of Organic Materials Deposition Equipment

  • Mini-SPECTROS
  • SPECTROS 100/150
  • Super-SPECTROS 150/200
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