1200ºC MIST CVD Furnace for Growth of Ga2O3 Crystals- OTF-1200X-Mist

Features

Furnace

• The splittable tube furnace with  1200oC Max. working temperature 
• 400 mm length heating zone with 125 mm length constant temperature zone.
• Quartz processing tube with flanges and the size of OD 60 mm x ID 54 mm x L 1000 mm 
• 30 segments programmable temperature controller with +/- 1ºC  accuracy
• Power:  3KW, 220VAC ( +/- 10% ）， single phase， 50、60Hz

Ultrasonic Mis Generator

•  1.7 Mhz ultrasonic generator is located in an airtight SS316 tank. ( click Pic left for specs )
  •  4 levels of ultrasonic power is for adjusting mist amount
  • Mist time is  30 - 180 minutes adjustable
• A liquid syringe pump is equipped to inject automatically which comes with a 60 ml plastic syringe. The speed range for the liquid injection pump is 0.004 ml/min - 70 ml/min
• The mist generator is connected to a tube furnace via 1/4" stainless steel tube

MFC Gas Delivery System

• 4 channels MFC gas mixing and delivering station is included  ( Click Pic left for specs)
• 2 channel gases are filled into stainless steel tank as carrying gas after mixing
• another 2 channels of gases are filled into tube furnace as diluting gas after mixing
• MFC flow rate: 0 - 500 ml/ minute adjustable
• MFC flow accuracy:  ±0.2%F.S
• Working pressure range: 0.1～0.5 MPa

Vacuum Pump ( optional )

• KF 25 vacuum port is installed on the flange of the processing tube with a valve to connect to a vacuum pump
• A dry pump is strongly recommended for the longer service life of Mist CVD.
• Please click the picture left to order  a pump if you need

Control Panel

• Touch screen control panel to set operation parameters, including
  • Temperature program and curve
  • 4 channels gas flow rate
  • Mist generating level and time
• RS 485 port and PC operation software is available upon request