(+65) 6284 3818




0.0/5 rating (0 votes)



Kurt J. Lesker ALD Series— offers stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of Kurt J. Lesker ALD system platforms feature full process control, integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.


  • Proprietary perpendicular flow reactant delivery for short cycle times and efficient reactant utilization
  • High throughput, centrally pumped for enhanced uniformity and reactant dispersion
  • Expandable LVP, HVP precursor delivery
  • Substrate heating - 500°C
  • Heated chamber walls, delivery lines and pumping lines
  • Fully enclosed framework and stand-alone electronics/control console
  • Scalable design allows for easy expansion
  • Global service and process support


  • University, industrial and government lab R&D
  • Semiconductor
  • Photovoltaics
  • OLED/organic electronics


  • Substrate load lock
  • Remote plasma
  • In-situ real time film growth analysis and control
  • Glove boxes
  • Oil free pumping
  • Multi-technique tools


Lesker ALD-150LX - Atomic Layer Deposition System, Up to 6" Substrates

Share this product

Please type your full name.
Invalid Input
Invalid Input
Invalid Input
Invalid email address.
Invalid Input
Invalid Input
Invalid Input
Invalid Input

Register for new product information:    

Premier Solutions (PS) Pte Ltd Singapore

Please publish modules in offcanvas position.