ALD-150LX

Kurt J. Lesker ALD Series— offers stand-alone ALD systems for basic research or completely integrated deposition systems for complex R&D applications. All of Kurt J. Lesker ALD system platforms feature full process control, integrated pumping, pressure measurement, and gas delivery packages optimized for your specific process.

Features

• Proprietary perpendicular flow reactant delivery for short cycle times and efficient reactant utilization
• High throughput, centrally pumped for enhanced uniformity and reactant dispersion
• Expandable LVP, HVP precursor delivery
• Substrate heating - 500°C
• Heated chamber walls, delivery lines and pumping lines
• Fully enclosed framework and stand-alone electronics/control console
• Scalable design allows for easy expansion
• Global service and process support

Applications

• University, industrial and government lab R&D
• Semiconductor
• Photovoltaics
• OLED/organic electronics

Options

• Substrate load lock
• Remote plasma
• In-situ real time film growth analysis and control
• Glove boxes
• Oil free pumping
• Multi-technique tools

Lesker ALD-150LX^™ - Atomic Layer Deposition System, Up to 6" Substrates