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AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

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AXXIS™—Facilitates multiple deposition techniques and co-deposited films efficiently!

The University of Alberta uses our AXXIS for glancing angle depositions (GLAD).

Typical Applications

  • R&D Thin Film Deposition


Process Options

  • Heating
  • Cooling
  • Bias
  • Ion Source for Substrate Cleaning/Assisted Deposition



  • 18" diameter x 15" deep cylindrical 304 stainless steel chamber
  • Six radial process ports
  • Hinged front-loading door
  • Door- or port-mounted substrate fixtures
  • Turbomolecular or cryogenic pumping
  • Available with up to six TORUS® circular magnetron sputtering sources
  • Available with up to 6-pocket 5.5kW electron beam source
  • Available with up to three thermal evaporation sources
  • Optional ion source
  • Open framework
  • Instrument rack



  • Substrate fixture indexing and rotation
  • Load lock
  • Computer-controlled process automation


Architecture Overview

KJLC® eKLipse™ Control Software

Kurt J. Lesker Company® eKLipse™ Controls Software is utilized on all KJLC platforms. The eKLipse™ controls platform utilizes a .NET application running on a Windows PC for its User Interface and Recipe Editor. Equipment automation is accomplished via a standalone Real Time Controller.Click to view Dwg-SY-eKLipseControlsSoftware_01


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