Phone(+65) 6284 3818 | sales@premier-sols.com | Enquriy |
AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques
Description
AXXIS™—Facilitates multiple deposition techniques and co-deposited films efficiently!
The University of Alberta uses our AXXIS for glancing angle depositions (GLAD).
Typical Applications
- R&D Thin Film Deposition
Process Options
- Heating
- Cooling
- Bias
- Ion Source for Substrate Cleaning/Assisted Deposition
Features
- 18" diameter x 15" deep cylindrical 304 stainless steel chamber
- Six radial process ports
- Hinged front-loading door
- Door- or port-mounted substrate fixtures
- Turbomolecular or cryogenic pumping
- Available with up to six TORUS® circular magnetron sputtering sources
- Available with up to 6-pocket 5.5kW electron beam source
- Available with up to three thermal evaporation sources
- Optional ion source
- Open framework
- Instrument rack
Optional
- Substrate fixture indexing and rotation
- Load lock
- Computer-controlled process automation
Architecture Overview
KJLC® eKLipse™ Control SoftwareKurt J. Lesker Company® eKLipse™ Controls Software is utilized on all KJLC platforms. The eKLipse™ controls platform utilizes a .NET application running on a Windows PC for its User Interface and Recipe Editor. Equipment automation is accomplished via a standalone Real Time Controller. |
Register for new product information: