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AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

AXXIS – Co-Sputtering, Thermal Evaporation, & Electron Beam Techniques

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Description

  

 

AXXIS™— Facilitates multiple deposition techniques and co-deposited films efficiently!

The University of Alberta uses Lesker AXXIS for glancing angle depositions (GLAD).

Typical Applications

  • R&D Thin Film Deposition

Deposition Techniques Available

  • Magnetron Sputtering (RF, DC, or Pulsed DC)
  • Electron Beam Evaporation
  • Thermal Evaporation

Process Options

  • Heating
  • Cooling
  • Bias
  • Ion Source for Substrate Cleaning/Assisted Deposition

Features

  • 18" diameter x 15" deep cylindrical 304 stainless steel chamber
  • Six radial process ports
  • Hinged front-loading door
  • Door- or port-mounted substrate fixtures
  • Turbo-molecular or cryogenic pumping
  • Available with up to six TORUS® circular magnetron sputtering sources
  • Available with up to 6-pocket 5.5kW electron beam source
  • Available with up to three thermal evaporation sources
  • Optional ion source
  • Open framework
  • Instrument rack

Optional

  • Substrate fixture indexing and rotation
  • Load lock
  • Computer-controlled process automation

 

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