Circular UHV Sources

We offer a comprehensive line of circular TORUS^® magnetron sputter sources, in 2" and 3" diameters, suited for ultra high vacuum R & D applications.

These sputter sources are "True UHV" cathodes, able to reach base pressures below 10-10 Torr due to their all-welded construction and 350° C bakeout temperature.

Their unique high-strength rare earth magnet arrays can be adjusted without breaking vacuum, enabling the user to optimize the sputtering profile.

Additionally, these sputter sources are available with an integral gas injection port for introducing the process gas directly to the target.

TORUS UHV Sources feature

• Versatile RF, DC, and Pulsed-DC operation
• True UHV all-welded design (no elastomeric seals)
• Excellent film uniformity (±3%) and target utilization (up to 30%)
• Integral gas injection port to introduce process gas at the target's surface
• Optional deposition chimneys and flip-style shutters reduce contamination during co-deposition
• High-strength rare earth magnet arrays for sputtering magnetic and non-magnetic materials available for 3" UHV source
• Magnet array is isolated from cooling water and can be removed without breaking vacuum
• Standard—Type-N (male) power connectors, indirect water cooling, and balanced magnetic operation
• Unbalanced operation is available (please contact us at This email address is being protected from spambots. You need JavaScript enabled to view it. for more information)
• Cathode bakeable to 350°C (with magnet array removed)