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EDC-650-8B Spin Processor

EDC-650-8B Spin Processor

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The Laurell EDC-650-8B Spin Processor is compact and packed with advanced features. This 650-series EDC system will accommodate up to ø200mm wafers and 7" × 7" (178mm × 178mm) substrates. Though this system has a 12,000 RPM capability with vacuum hold-down, it is recommended for only 3,000 RPM and non-vacuum chucks.


EDC-650-8B EDC System Specifications

Process Controller: The 650-series process controller utilizes a robust microprocessor and with the use of its accompanying PC software (written in an object-oriented programming language) it achieves nearly unheard of flexibility both in process definition and use. This controller allows operator interaction in real-time during the process execution including pausing time, stopping and continuing on from that point. The system can and will be continually updated easily and quickly in the field with downloadable firmware revisions. (we plan ahead at Laurell!) Researchers worldwide have developed unique processes which will ONLY run with the level of control sophistication we offer.

The 650-series controller can also be used in conjunction with a PC with Spin 3000, Laurell's exclusive process management software, however this is NOT required to program or run the equipment. The use of a PC adds the ability to record a process as it's run, operate remotely, program or communicate across a LAN or the Internet. The software, which is supplied at no additional cost, allows the operator to create virtual process simulations even beyond the capabilities of the hardware-installed spin processor, in effect letting them try it before they commit to a process. All 650 systems can be upgraded or re-purposed without return to the factory with simple plug-in modules, either actually or virtually, and can contain a near-unlimited number of processes and steps.

A Brief Description: The housing for this system is typically made from a solid co-polymer blend exclusive to Laurell Technologies. Unlike pure Natural Polypropylene, this material is able to resist solvents and strong acids and bases. Samples are available for testing and verification upon request. A solid PTFE Hostaflon® TFM-1600 / Teflon® AF housing is available (popular for high-temperature chemistry and sub-micron particle studies). Laurell's unique internal bowl-shaped chamber with its bottom gutter and clear dome lid controls the flow of liquids and gases efficiently from dispense point to drain.

No "splash rings" needed, or accidental drips onto the substrate. Our oversized Adjustable Down-Flow Exhaust and Drain allows and continuously monitors the process chamber's atmospheric balance, providing the user maximum control and repeatability. The 650 controller intelligently monitors not only the exhaust pressure within the process (standard), but optionally many other parameters, like temperature in a heated supply loop, drain water resistivity of a rinse, pH changes, etc. The upper plenum closes inside the base to provide an overlapping seal. The EDC™'s process chamber is electrically interlocked so rotation and dispensing are disabled when open and latched, and locked until finished with 0 RPM is sensed. A bowl-wash and dry routine can be added to each process or run independently. (another important Laurell EDC standard)

A proprietary labyrinth seal protects the motor and control electronics from chemical contamination. This seal provides the process chamber with Nitrogen purge and has been proven to be particle-free on a sub-micron level during field testing. The system's lid is chemically resistant, and only ECTFE-coated 316 stainless steel screws are used in some non-wetted areas throughout the system.

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