NANO 36™ – Affordable, Compact Sputtering or Thermal Evaporation Thin Film Deposition System

Process Chamber

• Removable and reconfigurable top and bottom plates on ISO 250 ports (10" tube)
• Horizontally oriented cylindrical stainless steel chamber body
• Spring-loaded, pendulum style, full-access, aluminum front door
• Appropriate pumping, process, gauging and instrumentation ports are included
• Quantity (2) viewports included in the chamber door. Viewports each have 1.26" Ø viewing area.

Vacuum Pumping & Gauging

• Pfeiffer 260 L/s turbomolecular pump with a KJLC RV206 oil sealed roughing pump.
• Wide range gauge reads from atmosphere to 10-9 Torr.

Safety

Fully enclosed system electronics rack.

• *Compact frame, 30.00" wide x 32.00" deep x 44.15" high (762mm wide x 812.8mm deep x 1121.4mm high)
• EMO Protection is standard on all KJLC systems.
• Isolation transformer and safety interlocks are standard on all KJLC systems.

*System dimensions and mounting dependent on options selected.

Quality

Utilizing industry leading components allows KJLC to produce the highest quality PVD R&D tool on the market. Components and key manufacturing points are:

• One year warranty standard
• Pfeiffer Turbomolecular pumps
• KJLC Low Temperature Sources
• KJLC Torus sputter sources, and power supplies
• Orbital welding on all process gas lines / manifolds

Pumping Options

• Dry Pump - Edwards nXDS6i - 3.6 cfm (6.2 m3/hr) Scroll roughing pump.

HV Valves

• 3-position gate valve for Pfeiffer 260 L/sec turbo

Low Temperature Evaporation Sources (Up to Four)

• 1cc and 10cc Sources
• Unique Plugin Design
• Easy to Refill and Maintain
• Quartz crystal controller is available with thermal options
• KJLC 10cc and 1cc (Low Temperature Evaporation) source, suitable for Organic and low temperature materials (0-550°C)

Thermal Evaporation Source (Up to Four)

• KJLC Thermal evaporation (TE) assembly, Up to four 2" thermal evaporation sources (in sequential and co-deposition configurations)
• Standard thermal power supply (12v @ 400A)
• Quartz crystal controller is available with thermal options

Low Temperature Evaporation Sources (Up to Two) and Thermal Evaporation Source (Up to Two)

• Provides capability to have up to two LTE and up to two Thermal Evaporation sources on one base plate
• Source sizes available are the same on the combination base plate as on the LTE only and Thermal Evaporation only base plates
• Quartz crystal controller is available with the combination base plate option

Torus® Magnetron Sputtering Source (Up to Three)

• Up to Three KJLC Torus® 2" or 3" magnetron sputtering sources. Flex head assembly and high strength magnet assembly options available.

For more information on our new Mag Keeper sources please see the following link.

(Up to Three) Power Supplies

• 500W, and 1kW, and 1.5kW KJLC® DC power supplies
• 300W KJLC RF power supply
• Quartz crystal monitor is available with sputtering options

The Nano 36 is designed to allow the use of square substrates 100mm x 100mm or smaller and round substrates up to 150mm diameter or smaller. The substrate platen accommodates multiple size substrates using a KJLC multi-site fixture and substrate clips. Custom substrate/mask holders are available upon request.

Standard substrate fixture options include:

• Rotation (up to 20 rpm)
• Rotation with heating (up to 350°C)
• Rotation with water cooling

Upstream Pressure Control

• Up to two Fujikin FCST1000F Mass Flow controllers and a 100mTorr Capacitance Manometer

Reactive Depositions

• One Fujikin FCST1000F Mass Flow controller and a 100mTorr Capacitance Manometer
• One Fujikin FCST1000F Mass Flow controller for a reactive gas.

Pumping:

The NANO 36 offers a Pfeiffer 260 L/s turbomolecular pump and KJLC RV206 oil sealed rough pump as standard components with an option to select an Edwards nXDS6i - 3.6 cfm (6.2 m3/hr) Scroll roughing pump.

Base pressure specification for the NANO 36 is 9 x 10-7 Torr.

Deposition:

The Nano 36 offers single and multi-technique deposition options (Thermal + LTE only) including thermal evaporation and magnetron sputtering (Torus).

Only KJLC offers Mag-Keeper sputter sources with zero o-rings in the cathode body and a magnetically coupled target to allow for easy target changes. (A game changer when changing a target through a glove box!) Our "patent pending" cooling well design enables operation at power densities ≥ 200 watts/.in2. This cathode is designed to sputter up to a 0.375" thick target on the 3" cathode and up to a 0.250" thick target on the 2" cathode. The high strength design is able to sputter up to a 0.125" thick Fe target with 3" cathodes, or 0.0625" thick Fe target with 2" Mag-Keepers. Without a hold down clamp or dark space shield this cathode is capable of running as low as ≤ 1mTorr. The unique dome shutter design eliminates the need for additional cross contamination shielding required with standard flip or swing shutters.

To learn more about sputtering rates and uniformity, click here.