NanoBeam nB5

The Nanobeam nB5 is an advanced electron beam lithography system. It’s predecessor, the nB4 is already a generation ahead of the current competition and with its field-proven performance has gained acceptance, recognition in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. Now with the development of the nB5, delivery time and service costs have been further reduced. The nB5 has a refined design and components to reduce routine service requirements, achieving a machine-fault-downtime of less than 5% annually. Furthermore, it has enhanced performance and can facilitate volume production. The nB5 will provide a platform for further development to high deflection speed and further integrated electronics.

Specifications:

Beam Voltage range               20kV – 100kV

Feature size on resist              <8nm

Stitching/overlay error           <25nm for 500um field

Automatic loading          5 chuck airlock system

Features:

Low Coulomb-effect Electron Optics

Unique auto-loading system

Advanced vibration tracking

Exceptional resistance to stray fields

Innovative TFE gun design

High throughput

Small foorprint

Low ownership cost