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Enquriy
TCVD-D100CA

TCVD-D100CA

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Description

Features
  • Size (mm) : 2300(W) x 1770(H) x 750(D)
  • Advanced Computer Controlled Automatic System
  • Optimized for graphene, CNT, h-BN TMDC growth
  • Water-cooled end chambers and doors
  • Process Temperature: ~1,100 ℃
  • Uniformity of Film Thickness : ≤+-3%
  • Testing Uniformity : ≤+-3%
  • Movable furnace method is our unique knowhow for fast heating fast cooling of the sample.

Specifications

  1. Thermal CVD Auto Operation system
  2. Both End chamber(Stainess) - All parts cooling by water
  3. Quartz Main chamber
  4. Gas control unit ( Mass flow controller) - 3channel standard
  5. 340liter/min Oil rotary pump
  6. Pneumatic On/off valve with Down stream Auto pressure control Throttle valve
    with controller
  7. Programmable Temperature controller
  8. High Temperature Furnace(Max1200℃)
  9. Rapid Cooling system by furnace moving
  10. Atmospheric and Vacuum Processing
  11. Anti-contamination system by inner tube
  12. Vacuum gauge unit(Capacitance/Convectron)
  13. 1 year warranty
  14. On-site install and training
  15. System Program ( Auto processing system)
  16. Furnace for source evaporation
  17. Safety interlock system(Water / Air)

Options

  1. Max temp 1500℃ Furnace by SIC source
  2. Rapid thermal processing furnace by IR lamp source
  3. MF power induction heating process Max temp 1600℃
  4. MFC(Mass flow controller) addition total 12channel
  5. Dry vacuum pump ( Scroll / booster / industry)
  6. Gas Safety interlock system for gas leak
  7. RF plasma ( ICP type )
  8. Tungsten filament gas source cracking
  9. High Vacuum processing option
    (Pump/Gauge/valve unit)
  10. Source delivery system ( Bubbler / Gas / Solid )
  11. System Utility ( Chiller / scrubber / gas cabinet )

Consumable Parts

  1. K-type Thermocouple (Option : R-type)
  2. Furnace heating element (Furnace repair)
  3. Vacuum sensor
  4. Oil in Rotary Oil Pump
  5. O-ring
  6. Quartz tube

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