Two Channels ALD 4" Tube Furnace System Upto 1200C - ALD-1200X-4

ALD-1200X-4 is a 4" tube furnace combining with two-channel ALD valves and one channel liquid-vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery system for CVD growth of nanomaterial and pi film,   The smart design makes ALD  more cost-effective and affordable for every research group.

SPECIFICATIONS:

Control Panel	All parameters of  ALD vapor puls time and  Gas flow  are controlled by PLC via a 6" touch screen panel in a mobile cart  Control Two  ALD valves with puls duration time and cycling with   mico-second precision Control For channels gas delivery with ±0.2%F.S via MFC Display vacuum pressure  Other parameters upon request of the customer Please click the picture below to see the control interface
ALD valve	Two ALD valves with pulse controller (min 10 ms duration) Capable of heating with thermal actuators
Dual Zone Split Tube furnace	Max 1100ºC for continuous heating Two programmable precision digital temperature controllers with 30 segments. Two separate controlled Heating Zones 200mm length for each heating zone 400mm total in heating length 250mm constant central temperature heating area if both zones were heated at the same temperature 500ºC max temperature difference between two zones with thermal blocks in between Input power: 208 – 240V AC input, a single phase at max. 4KW Optional: ALD control system can be installed with a short tube furnace or rotation tube furnace as the picture below
Anti-corrosive Pressure Gauge	3.8x10-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent  High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection Fast atmospheric detection eliminates waiting time and shortens the process cycle Easy to exchange plug & play sensor element Click the picture to view detailed spec.
Vacuum Pump  (optional)	10E-2 Torr vacuum can be achieved inside the processing tube A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below
More Bubbler Optional	Click the picture below to order bubbler or evaporator for CVD, and  below right for Constant pressure control module Could add Quartz Crystal and thermocouple  to monitoring thin film thickness and temperature at extra cost
Update Idea	You may use ALD Device to build hybrid Plasma enhanced ALD+ CVD  and ALD+PVD+CVD system to grow complex materials and Powder ALD with rotation furnace (PE-ALD+CVD)            (PE-ALD+PVD +CVD)
Warranty	One year limited warranty with lifetime support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements at related products below).
Compliance	CE certified and NRTLor CSA certification is available upon request at the extra cost.
Application Notes Click here to learn how to a gas regulator	Tube furnaces with quartz tubes are designed for use under vacuum and low pressure < 0.2 bars / 3 psi  Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation. Click here to learn the installation of a gas regulator. The flow rate for gasses should be limited to < 200 SCCM for reducing thermal shocks to the tube Vacuum limit definition for all quartz tube furnaces: * Vacuum pressures may only be safely used up to 1000°C Click here to learn How to set up quartz/ ceramic tube and vacuum flange for MTI Tube furnace.
Application	Using ALD to significantly decrease the high solid-solid interfacial impedance between the garnet electrolyte and electrode materials. Related Article:  Negating interfacial impedance in garnet-based solid-state Li metal batteries
Operation Instructions