AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.
Specifications
- Useful area: 90%
- Nominal AlN thickness: 500nm ±10%, one side coated, undoped AlN film
- Front Surface: <1nm RMS, as-grown
- Back surface: silicon N-type
- AlN orientation: C-plane (00.1)
- Macro Defect Density: <1/cm^2
- Wafer base: Silicon [111]N type, 2" dia x0.5 mm, , one side polished