Undoped AlN Template on Silicon ( Si P type )

AlN  Template on Silicon is made by a PVDNC method.  AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.

Specifications

• Useful area: 90%
• Nominal AlN thickness: 200nm ±10%, one side coated, undoped AlN film
• Front Surface: <1nm RMS,    as-grown
• Back surface: silicon as received
• AlN orientation: C-plane (00.1)
• Macro Defect Density: <1/cm^2
• Wafer base: Silicon [111] P-type, 5x5 x0.5 mm, 10mmx10mm x 200 nm, one side polished