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The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).
Process Controller: The 650-series process controller utilizes a robust microprocessor and, with the use of its accompanying PC software (written in an object-oriented programming language), it achieves nearly unheard of flexibility both in process definition and use. This controller allows operator interaction in real-time during the process execution including pausing time, stopping and continuing on from that point. The system can and will be continually updated easily and quickly in the field with downloadable firmware revisions. (We plan ahead at Laurell!)
Researchers worldwide have developed unique processes which will ONLY run with the level of control sophistication we offer. The 650-series controller can also be used in conjunction with a PC with Spin 3000, Laurell's exclusive process management software. However, this is NOT required to program or run the equipment. The use of a PC adds the ability to record a process as it's run, operate remotely, program or communicate across a LAN or the Internet. The software, which is supplied at no additional cost, allows the operator to create virtual process simulations even beyond the hardware actually installed spin processor, in effect, letting them try it before they commit to a process. All 650 systems can be upgraded or re-purposed without return to the factory with simple plug-in modules, either actually or virtually, and can contain a virtually unlimited number of processes and steps.
A Brief Description: The housing for this system is typically made from a solid co-polymer blend exclusive to Laurell Technologies. Unlike pure Natural Polypropylene, this material is able to resist solvents and strong acids and bases. Samples are available for testing and verification upon request. A solid PTFE Hostaflon® TFM-1600 / Teflon® AF housing is available (popular for high temperature chemistry and sub-micron particle studies).
Laurell's unique internal bowl design eliminates splash back, making it unnecessary to install "splash rings." Our Exhausted Drain Adapter with removable reservoir is as functional as it is convenient.
The closed bowl design, coupled with the precision of the process controller, allows most coating materials to dry in a quiescent state, increasing uniformity and minimizing particle contamination. The upper plenum closes inside the base to provide an overlapping seal, and the inside of the lid has a special gutter to channel fluid to the rear of the system to discourage chemicals from accidentally dripping onto the substrate.
A proprietary labyrinth seal protects the motor and control electronics from chemical contamination. This seal provides the process chamber with Nitrogen purge and has been proven to be particle-free on a sub-micron level during field testing. The system's lid is chemically resistant, and only ECTFE-coated 316 stainless steel screws are used in some non-wetted areas throughout the system.