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  4. Annealsys DLI-CVD / DLI-ALD
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Annealsys DLI-CVD / DLI-ALD

MC-050

MC-050

Metal Organic Chemical Vapor Deposition ( MOCVD )

The MC-050 offers the widest capabilities for development of new materials including single and multi-metallic oxides as well as transition metal dichalcogenides (TMD) and other 2D materials.

MC-100

MC-100

Metal Organic Chemical Vapor Deposition ( MOCVD )

The Annealsys MC-100 is a 4-inch (100 mm) Direct Liquid Injection deposition system that can perform CVD, ALD, pulse pressure CVD inside the same process chamber. Applications include epitaxy of oxide layers like LiNbO3.

 

MC-200

MC-200

 Metal Organic Chemical Vapor Deposition ( MOCVD )

The Annealsys MC-200 is a versatile deposition system that can perform metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) inside the same process chamber

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