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Items starting with M

MC 200

MC 200

 Metal Organic Chemical Vapor Deposition ( MOCVD )

The Annealsys MC-200 is a versatile deposition system that can perform metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) inside the same process chamber

MC 100

MC 100

Metal Organic Chemical Vapor Deposition ( MOCVD )

The Annealsys MC-100 is a 4-inch (100 mm) Direct Liquid Injection deposition system that can perform CVD, ALD, pulse pressure CVD inside the same process chamber. Applications include epitaxy of oxide layers like LiNbO3.

 

MC 050

MC 050

Metal Organic Chemical Vapor Deposition ( MOCVD )

The MC-050 offers the widest capabilities for development of new materials including single and multi-metallic oxides as well as transition metal dichalcogenides (TMD) and other 2D materials.

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