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Annealsys RTP and RTCVD versatile systems

Zenith-150

Zenith-150

The right system for growth of graphene mono layer and rapid thermal implant annealing of silicon carbide wafers

AS-One

AS-One

The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes.

AS-Micro

AS-Micro

 Rapid Thermal Processing / Annealing / Rapid Thermal Chemical Vapor Deposition ( RTP / RTA / RTCVD ) 

 

AS-Master

AS-Master

The cold wall chamber in association with the pulse annealing capability is a unique solution for annealing of thermally sensitive substrates.

AS-Premium

AS-Premium

The AS-Premium double side heating has been developed for annealing compound semiconductor wafers using silicon carbide coated susceptors.

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