Atomic Layer Deposition Systems

KJLC^® currently offers two state-of-the-art systems for Atomic Layer Deposition (ALD): the ALD150LX™ and the ALD150LE™. As substrate features continue to decrease in size while increasing in complexity, ALD techniques will become increasingly important to meet the strict demands for conformal, pristine, high quality thin films and their interfaces. Both of these systems are ideally suited to meet even the most demanding challenges associated with next generation 3D nanotechnology.

Our ALD platform features high quality, compact designs that provide extreme flexibility while maintaining system component accessibility and serviceability. All system components meet the highest of quality standards, including parts manufactured in-house by our Manufacturing Division.