The TCVD-RF100CA has a plasma system, making low temperature growth and bulk processing possible. It has an automatic furnace moving system, designed to move back and forth on a dual rail system. In addition, precision sensors allow automatic movement on level position, this system allows fast-heating and fast-cooling. Its safety cabinet is a total enclosure for the system with an emergency shut-off button, protecting the user in dangerous situations. It also has a 12” Dual-core performance PC system, that you are able to control remotely. Furthermore, it is able to support growth of high-quality graphene as well as other 2D materials with safety features.